27 September 2026 to 2 October 2026
GADEST 2026 - San Servolo Island, Venice (Italy)
Europe/Rome timezone

Tuning superconductivity in ultra-doped Si and SiGe epilayers with Nanosecond Laser Doping

28 Sept 2026, 08:30
40m
Auditorium Hall

Auditorium Hall

Invited presentation Group IV Semiconductors - I Group IV: Hyperdoping and Defects

Speaker

Francesca Chiodi (C2N, Université Paris Saclay)

Description

Since the discovery of BCS superconductivity in silicon by nanosecond laser ultra-doping with boron, theoretical and experimental works have endeavored to understand what triggers and controls the superconducting phase. Indeed, superconducting Si has great potential to develop a cryogenic electronics with the advantages of large scale integration and high reproducibility [1,2]. Through the optimization of the nanosecond laser temporal profile, we achieved an excellent control of both the electrical and structural properties of ultra-doped Si thin layers, with a maximum carrier concentration of 8 at.%, the state of the art, in monocrystalline epilayers with few defects, 100% dopant activation up to and above the solubility limit, and a vertically homogeneous doping profile [1-3].
The control and improvement of the active doping is directly reflected in the control of the superconducting critical temperature Tc of such disordered superconductor, increased by 30% in this optimized setup, in agreement with theory and opposite to previous results (Fig.1) [4].
Furthermore, we demonstrated that superconductivity is not only controlled by doping, but also by the lattice deformation. Thus, it is possible to tune up to 50% Tc by modifying by 1% the lattice parameter, as shown through nanosecond laser incorporation of Ge up to 20 at.% [5].
Mastering and understanding the materials properties has brought to the development of all-silicon devices, such as Josephson junctions and superconducting microwave resonators [6].
Indeed, SQUIDs and Josephson junctions were developed [7], thanks to the excellent, epitaxial, transparent interface between superconducting Si and semiconducting Si, that we have characterized both at room temperature and at sub-K temperatures as a function of the semiconductor doping.

[1] F. Chiodi, et al., Laser Annealing Processes in Semiconductor Technology (Elsevier), ch.9 (2021)
[2] Y. Baron et al., Appl. Phys. Lett. Materials 12 (12), (2024)
[3] G. Hallais, et al., Semicond. Sci.Tech. 38, 034003 (2023)
[4] L. Desvignes. PhD thesis, Université Paris Saclay (2023)
[5] S. Nath, et al., Phys. Status Solidi A, 221: 2400313 (2024)
[6] P. Bonnet, F. Chiodi, et al., Phys. Rev. Applied 17, 034057 (2022)
[7] F. Chiodi, et al., Phys. Rev. B 96, 024503 (2017)

Authors

Léonard Desvignes Aiken van Waveren Pierre Bonnet Raphaelle Delagrange Géraldine Hallais Ludovic Largeau Bernard Sermage Alberto Debernardi Michele Amato Hélène le Sueur Dominique Débarre Francesca Chiodi (C2N, Université Paris Saclay)

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