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SUMMARY:Pulsed UV excimer laser crystallization of sputter-deposited MoS2 
 films
DTSTART:20260604T143000Z
DTEND:20260604T144500Z
DTSTAMP:20260621T231500Z
UID:indico-event-1850@indico.dfa.unipd.it
DESCRIPTION:Speakers: Daniele Demeneghi\n\n\n\nThe integration of transiti
 on metal dichalcogenides (TMDs) into devices for nanoelectronics\, optics\
 , and sensing requires a growth method that is cheap\, scalable\, and comp
 atible with the processes used in the semiconductor industry. An unconvent
 ional approach is the Pulsed Laser Annealing (PLA) of amorphous TMDs depos
 ited through sputtering to induce an ultra-rapid thermal treatment confine
 d to the surface of the sample. In this work an excimer UV laser is used t
 o crystallize 2-8 nm thick MoS2 films deposited on SiO 2 /Si substrates. R
 aman\, AFM and RBS are employed to study films fabricated with a range of 
 laser processing parameters. Optimal processing conditions were found that
  will allow to investigate the crystallization mechanism. Finally\, this w
 ork shows another avenue to speed up the integration of large-area 2D mate
 rials with Si-based devices.\n\n\n\nhttps://indico.dfa.unipd.it/event/1850
 /
LOCATION:1/1-3 - Aula B (Dipartimento di Fisica e Astronomia - Edificio Ma
 rzolo)
URL:https://indico.dfa.unipd.it/event/1850/
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